Volume 8 Issue 1 ( March 2021 )


A Statistical Analysis of Sputtering Parameters on Superconducting Properties of Niobium Thin Film

Gaurav Gupta, R. K. Tyagi, S. K. Rajput


With everchanging technology and constantly increasing demand of energy, superconducting materials can play a crucial role as by offering lowest possible electrical resistance. In this quest, Niobium (Nb) thin films synthesized by magnetron sputtering has been analyzed at diverse sputtering constraints. Different parameters as Nitrogen (N2) partial pressure, power densities, magnetization are explored by Usadel equation. Usadel equation integrating Bardeen-Cooper-Schrieffer theory of superconductivity, analyzed dependence of superconducting transitiontemperature on varied sputtering parameters by computational technique. It has been found that Nioubium Nitride (NbN) operating at elevated temperature exhibits superconductive properties. Optimal growth is found at N2 partial pressure ~15 Standard Cubic Centimeters per Minute (SCCM) where power densities ranges from 200 to 500W at a critical temperature of 14.5K.

Keywords: Sputtering; Superconducting; Thin film; Growth